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Study on temperature field and flow field of doped oxidized silicon wafer prepared by vertical furnace
Yang, Shuai, Song, Jiannong, Sun, NanVolume:
322
Language:
english
Journal:
IOP Conference Series: Materials Science and Engineering
DOI:
10.1088/1757-899X/322/4/042024
Date:
March, 2018
File:
PDF, 734 KB
english, 2018