Atomic Layer Deposition of Nickel Using a Heteroleptic Ni...

ACS Omega 2019 / 06 Vol. 4; Iss. 6

Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH 3 and Selective Deposition on Defects of Graphene

Kim, Minsu, Nabeya, Shunichi, Nandi, Dip K., Suzuki, Kazuharu, Kim, Hyun-Mi, Cho, Seong-Yong, Kim, Ki-Bum, Kim, Soo-Hyun
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
4
Language:
english
Journal:
ACS Omega
DOI:
10.1021/acsomega.9b01003
Date:
June, 2019
File:
PDF, 4.81 MB
english, 2019
Conversion to is in progress
Conversion to is failed