Thiol and Halometallate, Mutually Passivated Quantum Dot...

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ACS Applied Materials & Interfaces 2019 / 07

Thiol and Halometallate, Mutually Passivated Quantum Dot Ink for Photovoltaic Application

Mandal, Debranjan, Goswami, Prasenjit Nanda, Rath, Arup Kumar
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Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.9b07605
Date:
July, 2019
File:
PDF, 893 KB
english, 2019
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