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Modeling of ICP C4F8 plasma : effects of high RF power on the plasma electrical properties
Le Dain, Guillaume, Rhallabi, Ahmed, Girard, Aurelie, Cardinaud, Christophe, Roqueta, Fabrice, Boufnichel, MohamedLanguage:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/1361-6595/ab27d0
Date:
June, 2019
File:
PDF, 1.70 MB
english, 2019