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Remotely induced high-density hollow-anode plasma and its application to fast deposition of photosensitive microcrystalline silicon thin film with preferential orientation
Tabuchi, Toshihiro, Toyoshima, Yasumasa, Fujimoto, Shinichi, Takashiri, MasayukiVolume:
9
Journal:
AIP Advances
DOI:
10.1063/1.5095550
Date:
May, 2019
File:
PDF, 3.34 MB
2019