Physical Characterization of Hafnium Oxide Thin Films Annealed in Vacuum
Václavek, Lukáš, Tomaštík, Jan, Nožka, Libor, Čtvrtlík, RadimVolume:
784
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.784.135
Date:
October, 2018
File:
PDF, 790 KB
english, 2018