Structure and Oxidation Behavior CrN Thin Films Deposited...

Key Engineering Materials 2019 / 4 Vol. 798

Structure and Oxidation Behavior CrN Thin Films Deposited Using DC Reactive Magnetron Sputtering

Buranawong, Adisorn, Witit-Anun, Nirun
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Volume:
798
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.798.122
Date:
April, 2019
File:
PDF, 5.25 MB
english, 2019
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