Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma
Yang, Kyung Chae, Shin, Ye Ji, Tak, Hyun Woo, Lee, Wonseok, Lee, Seung Bae, Yeom, Geun YoungLanguage:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2019.108802
Date:
July, 2019
File:
PDF, 7.06 MB
english, 2019