Immunity to Contact Scaling in MoS 2...

Nano Letters 2019 / 07

Immunity to Contact Scaling in MoS 2 Transistors Using in Situ Edge Contacts

Cheng, Zhihui, Yu, Yifei, Singh, Shreya, Price, Katherine, Noyce, Steven G., Lin, Yuh-Chen, Cao, Linyou, Franklin, Aaron D.
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Language:
english
Journal:
Nano Letters
DOI:
10.1021/acs.nanolett.9b01355
Date:
July, 2019
File:
PDF, 5.09 MB
english, 2019
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