Advancing the next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists
Tiwale, Nikhil, Subramanian, Ashwanth, Kisslinger, Kim, Lu, Ming, Kim, Jiyoung, Stein, Aaron, Nam, Chang-YongYear:
2019
Language:
english
Journal:
Journal of Materials Chemistry C
DOI:
10.1039/C9TC02974E
File:
PDF, 1.96 MB
english, 2019