In - situ...

Journal of Applied Physics 2019 / 07 Vol. 126; Iss. 2

In - situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition

Zanáška, M., Kudrna, P., Čada, M., Tichý, M., Hubička, Z.
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Volume:
126
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5102163
Date:
July, 2019
File:
PDF, 3.32 MB
english, 2019
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