Plasma-Enhanced Atomic Layer Deposition of HfO...

ACS Applied Nano Materials 2019 / 07

Plasma-Enhanced Atomic Layer Deposition of HfO 2 on Monolayer, Bilayer, and Trilayer MoS 2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices

Price, Katherine M., Najmaei, Sina, Ekuma, Chinedu E., Burke, Robert A., Dubey, Madan, Franklin, Aaron D.
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Language:
english
Journal:
ACS Applied Nano Materials
DOI:
10.1021/acsanm.9b00505
Date:
July, 2019
File:
PDF, 4.89 MB
english, 2019
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