Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering
Tatejima, Kota, Nagata, Takahiro, Ishibashi, Keiji, Takahashi, Kenichiro, Suzuki, Setsu, Ogura, Atsushi, Chikyow, ToyohiroVolume:
58
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab088f
Date:
June, 2019
File:
PDF, 1.07 MB
english, 2019