![](/img/cover-not-exists.png)
Effects of fluorine based double plasma treatment on electrical and reliability characteristics of Ge pMOSFETs
Ruan, Dun-Bao, Chang-Liao, Kuei-Shu, Li, Ji-Syuan, Yi, Shih-Han, Liu, Guan-Ting, Chiu, Po-Chen, Li, Yan-LinVolume:
215
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2019.111025
Date:
July, 2019
File:
PDF, 1.55 MB
english, 2019