Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for...

Applied Surface Science 2019 / 10 Vol. 492

Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering

Hanby, Benjamin V.T., Stuart, Bryan W., Gimeno-Fabra, Miquel, Moffat, Jonathan, Gerada, Chris, Grant, David M.
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Volume:
492
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.06.202
Date:
October, 2019
File:
PDF, 1.96 MB
2019
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