Influence of post-deposition annealing on characteristics...

Microelectronic Engineering 2019 / 08 Vol. 216

Influence of post-deposition annealing on characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors

Hirose, Masafumi, Nabatame, Toshihide, Yuge, Kazuya, Maeda, Erika, Ohi, Akihiko, Ikeda, Naoki, Irokawa, Yoshihiro, Iwai, Hideo, Yasufuku, Hideyuki, Kawada, Satoshi, Takahashi, Makoto, Ito, Kazuhiro, K
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Volume:
216
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2019.111040
Date:
August, 2019
File:
PDF, 686 KB
english, 2019
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