Growth of narrow substrate temperature window on the crystalline quality of InN epilayers on AlN/Si(1 1 1) substrates using RF-MOMBE
Chen, Wei-Chun, Chen, Hung-Pin, Lin, Yu-Wei, Liu, Da-RenVolume:
522
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2019.06.031
Date:
September, 2019
File:
PDF, 3.75 MB
2019