Surface roughness analysis of Cu films deposited on Si substrates: A molecular dynamic analysis
Chen, Zhiqiang, Cao, Yunqi, Tian, Wenchao, Wang, YongkunVolume:
126
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5095139
Date:
July, 2019
File:
PDF, 6.03 MB
english, 2019