Advancing the next generation nanolithography with...

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Advancing the next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

Tiwale, Nikhil, Subramanian, Ashwanth, Kisslinger, Kim, Lu, Ming, Kim, Jiyoung, Stein, Aaron, Nam, Chang-Yong
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Year:
2019
Journal:
Journal of Materials Chemistry C
DOI:
10.1039/C9TC02974E
File:
PDF, 1.96 MB
2019
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