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Solid phase epitaxial thickening of boron and phosphorus doped polycrystalline silicon thin films formed by aluminium induced crystallization technique on glass substrate
Özmen, Ö. Tüzün, Karaman, M., Sedani, S.H., Sağban, H.M., Turan, R.Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.137451
Date:
August, 2019
File:
PDF, 853 KB
english, 2019