In - situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
Zanáška, M., Kudrna, P., Čada, M., Tichý, M., Hubička, Z.Volume:
126
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5102163
Date:
July, 2019
File:
PDF, 3.32 MB
2019