An Effective Process to Remove Etch Damage Prior to...

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Semiconductor Science and Technology 2019 / 07

An Effective Process to Remove Etch Damage Prior to Selective Epitaxial Growth in 3D NAND Flash Memory

Luo, Liuyang, Lu, Zhiyong, Zou, Xingqi, Zhang, Yu, Zhang, Bao, Zhao, Chenglin, Zhao, Zhiguo, Li, Chunlong, Huo, Zongliang
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Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/ab3130
Date:
July, 2019
File:
PDF, 690 KB
2019
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