Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography
Yoshifuji, Mana, Niihara, Shota, Harada, Tetsuo, Watanabe, TakeoVolume:
58
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab049f
Date:
June, 2019
File:
PDF, 1.08 MB
2019