Effect of additives on preparation of vertical holes in Si substrate using metal-assisted chemical etching
Shimizu, Tomohiro, Niwa, Ryosuke, Ito, Takeshi, Shingubara, ShosoVolume:
58
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab0ff5
Date:
June, 2019
File:
PDF, 736 KB
2019