In situ TEM study of the transitions between...

Journal of Applied Physics 2019 / 06 Vol. 125; Iss. 24

In situ TEM study of the transitions between crystalline Si and nonstoichiometric amorphous oxide under bipolar voltage bias

Tian, Xinchun, Ma, Tao, Zhou, Lin, Brennecka, Geoff, Tan, Xiaoli
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Volume:
125
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5100310
Date:
June, 2019
File:
PDF, 2.97 MB
english, 2019
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