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Opportunities and Challenges in APT Metrology for Semiconductor Applications
Fleischmann, Claudia, Cuduvally, Ramya, Morris, Richard, Melkonyan, Davit, de Beeck, Jonathan Op, Makhotkin, Igor, van der Heide, Paul, Vandervorst, WilfriedVolume:
25
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/S1431927619002290
Date:
August, 2019
File:
PDF, 123 KB
english, 2019