Opportunities and Challenges in APT Metrology for...

Opportunities and Challenges in APT Metrology for Semiconductor Applications

Fleischmann, Claudia, Cuduvally, Ramya, Morris, Richard, Melkonyan, Davit, de Beeck, Jonathan Op, Makhotkin, Igor, van der Heide, Paul, Vandervorst, Wilfried
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Volume:
25
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/S1431927619002290
Date:
August, 2019
File:
PDF, 123 KB
english, 2019
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