Damage recovery and low‐damage etching of ITO in H...

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Plasma Processes and Polymers 2019 / 04

Damage recovery and low‐damage etching of ITO in H 2 /CO plasma: Effects of hydrogen or oxygen

Hirata, Akiko, Fukasawa, Masanaga, Kugimiya, Katsuhisa, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Nagaoka, Kojiro
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Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201900029
Date:
April, 2019
File:
PDF, 540 KB
english, 2019
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