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Rapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS 2 films using gas-phase chemical vapor deposition
Shinde, Nitin Babu, Francis, Bellarmine, Ramachandra Rao, M. S., Ryu, Beo Deul, Chandramohan, S., Eswaran, Senthil KumarVolume:
7
Language:
english
Journal:
APL Materials
DOI:
10.1063/1.5095451
Date:
August, 2019
File:
PDF, 4.93 MB
english, 2019