Interface Modification of HfO2-based ReRAM via Low...

Semiconductor Science and Technology 2019 / 07

Interface Modification of HfO2-based ReRAM via Low Temperature Anneal

Beckmann, Karsten, Suguitan, Nadia, Van Nostrand, Joseph, Cady, Nathaniel C.
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Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/ab362a
Date:
July, 2019
File:
PDF, 981 KB
2019
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