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Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition
Li, Junpeng, Wu, Jianzhuo, Liu, Junqing, Sun, JiamingVolume:
14
Language:
english
Journal:
Nanoscale Research Letters
DOI:
10.1186/s11671-019-2907-0
Date:
December, 2019
File:
PDF, 1.08 MB
english, 2019