![](/img/cover-not-exists.png)
Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system
An, Byeong-Seon, Kwon, Yena, Oh, Jin-Su, Shin, Yeon-Ju, Ju, Jae-seon, Yang, Cheol-WoongVolume:
49
Language:
english
Journal:
Applied Microscopy
DOI:
10.1186/s42649-019-0008-2
Date:
December, 2019
File:
PDF, 1.53 MB
english, 2019