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[IEEE 2019 Electron Devices Technology and Manufacturing Conference (EDTM) - Singapore, Singapore (2019.3.12-2019.3.15)] 2019 Electron Devices Technology and Manufacturing Conference (EDTM) - Low Temperature Plasma Process for Si/SiGe Dual Channel Fin Application
Ishii, Yohei, Lee, Yao-Jen, Wu, Wen-Fa, Maeda, Kenji, Ishimura, Hiroaki, Miura, MakotoYear:
2019
DOI:
10.1109/EDTM.2019.8731035
File:
PDF, 134 KB
2019