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[IEEE 2019 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2019.3.18-2019.3.19)] 2019 China Semiconductor Technology International Conference (CSTIC) - Estimating the Etching Depth Limit in Deep Silicon Etching
Zhao, Yuanhe, Lin, YuanweiYear:
2019
Language:
english
DOI:
10.1109/CSTIC.2019.8755766
File:
PDF, 897 KB
english, 2019