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[IEEE 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2019.4.22-2019.4.25)] 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Interfacial engineering of SOT-MRAM to modulate atomic diffusion and enable PMA stability >400 °C
Bi, Chong, Lin, Shy-Jay, Li, Xiang, Simsek, Telem, Song, M., Tsai, Wilman, Wang, Shan X.Year:
2019
Language:
english
DOI:
10.1109/VLSI-TSA.2019.8804669
File:
PDF, 684 KB
english, 2019