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[IEEE 2019 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2019.3.18-2019.3.19)] 2019 China Semiconductor Technology International Conference (CSTIC) - Plasma Process Optimization of Silicon Film Deposition from Trichlorosiliane Precursor with OES Monitoring
Lee, Chien-Chieh, Wang, Song-Ho, Chang, Hsueh-Er, Fuh, Yiin-Kuen, Li, Tomi T., Chiou, Ya-Hui, Cheng, Hsin-ChuanYear:
2019
Language:
english
DOI:
10.1109/cstic.2019.8755637
File:
PDF, 894 KB
english, 2019