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A non-volatile AND gate based on Al2O3/HfO2/Al2O3 charge-trap stack for in-situ storage applications
Li, Jingyu, Zhang, Heng, Ding, Yi, Li, Jiayi, Wang, Shuiyuan, Zhang, David Wei, Zhou, PengLanguage:
english
Journal:
Science Bulletin
DOI:
10.1016/j.scib.2019.08.012
Date:
August, 2019
File:
PDF, 2.28 MB
english, 2019