GO/C2S Gate Dielectric Material for Nanoscale Devices...

GO/C2S Gate Dielectric Material for Nanoscale Devices Obtained via Pechini Method

Hussein Salmani,, Ali Bahari,
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Volume:
55
Language:
english
Journal:
Surface Engineering and Applied Electrochemistry
DOI:
10.3103/S1068375519040136
Date:
July, 2019
File:
PDF, 1.11 MB
english, 2019
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