Analysis of surface adsorption kinetics of SiH4 and Si2H6...

Applied Surface Science 2019 / 12 Vol. 496

Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas

Park, Hwanyeol, Yoon, Euijoon, Lee, Gun-Do, Kim, Ho Jun
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Volume:
496
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.143728
Date:
December, 2019
File:
PDF, 3.27 MB
english, 2019
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