Dependence of electrical properties on sulfur distribution in atomic-layer-deposited HfO2 thin film on an InP substrate
Jin, Hyun Soo, Seok, Tae Jun, Cho, Deok-Yong, Park, Tae JooVolume:
491
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.06.100
Date:
October, 2019
File:
PDF, 955 KB
english, 2019