Photolithographic Masking Method to Chemically Pattern Silk...

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Photolithographic Masking Method to Chemically Pattern Silk Film Surfaces

Patamia, Evan D., Ostrovsky-Snider, Nicholas A., Murphy, Amanda R.
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Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.9b10226
Date:
September, 2019
File:
PDF, 13.80 MB
english, 2019
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