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Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching
Osipov, Artem A., Iankevich, Gleb A., Alexandrov, Sergey E.Language:
english
Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-019-10025-6
Date:
September, 2019
File:
PDF, 974 KB
english, 2019