A Si stencil mask for deep X-ray lithography fabricated by...

Microsystem Technologies 2008 / 10 Vol. 14; Iss. 9-11

A Si stencil mask for deep X-ray lithography fabricated by MEMS technology

Harutaka Mekaru, Takayuki Takano, Yoshiaki Ukita, Yuichi Utsumi, Masaharu Takahashi
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Volume:
14
Language:
english
Pages:
8
DOI:
10.1007/s00542-007-0513-z
Date:
October, 2008
File:
PDF, 747 KB
english, 2008
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