Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography
M. Chatzichristidi, I. Rajta, Th. Speliotis, E. Valamontes, D. Goustouridis, P. Argitis, I. RaptisVolume:
14
Language:
english
Pages:
6
DOI:
10.1007/s00542-008-0571-x
Date:
October, 2008
File:
PDF, 348 KB
english, 2008