High-Quality Doped Polycrystalline Silicon Using...

Energy Procedia 2018 / 09 Vol. 150

High-Quality Doped Polycrystalline Silicon Using Low-Pressure Chemical Vapor Deposition (LPCVD)

Padhamnath, Pradeep, Nandakumar, Naomi, Kitz, Buatis Jammaal, Balaji, Nagarajan, Naval, Marvic-John, Shanmugam, Vinodh, Duttagupta, Shubham
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Volume:
150
Language:
english
Journal:
Energy Procedia
DOI:
10.1016/j.egypro.2018.09.014
Date:
September, 2018
File:
PDF, 562 KB
english, 2018
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