Characterization of Al Incorporation into HfO2 Dielectric...

Micromachines 2019 / 05 Vol. 10; Iss. 6

Characterization of Al Incorporation into HfO2 Dielectric by Atomic Layer Deposition

Rahman, Md. Mamunur, Kim, Jun-Gyu, Kim, Dae-Hyun, Kim, Tae-Woo
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Volume:
10
Language:
english
Journal:
Micromachines
DOI:
10.3390/mi10060361
Date:
May, 2019
File:
PDF, 4.33 MB
english, 2019
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