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Nitridation of niobium films by rapid thermal processing: different behaviour of films on oxydized silicon and monocrystalline sapphire substrates
Oliver Brunkahl, Regine Mertens, Wolfgang Bock, Klaus Thoma, Bernd Ottmar KolbesenVolume:
156
Language:
english
Pages:
13
DOI:
10.1007/s00604-006-0589-7
Date:
November, 2006
File:
PDF, 809 KB
english, 2006