In situ monitoring of surface reactions...

ACS Applied Materials & Interfaces 2019 / 09

In situ monitoring of surface reactions during atomic layer etching of silicon nitride using hydrogen plasma and fluorine radicals

Nakane, Kazuya, Vervuurt, René H. J., Tsutsumi, Takayoshi, Kobayashi, Nobuyoshi, Hori, Masaru
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.9b11489
Date:
September, 2019
File:
PDF, 2.07 MB
2019
Conversion to is in progress
Conversion to is failed