The effect of citric acid based cleaning solution on...

Microelectronic Engineering 2019 / 08 Vol. 216

The effect of citric acid based cleaning solution on particle adhesion and removal during post-Cu CMP cleaning

Zhang, Lifei, Wang, Tongqing, Lu, Xinchun
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Volume:
216
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2019.111090
Date:
August, 2019
File:
PDF, 1.84 MB
2019
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