Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2019 / 09 Vol. 37; Iss. 5
Investigation of ma-N 2400 series photoresist as an electron-beam resist for superconducting nanoscale devices
Toomey, Emily, Colangelo, Marco, Berggren, Karl K.Volume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5119516
Date:
September, 2019
File:
PDF, 1.53 MB
english, 2019