Effects of normal load and etching time on current evolution of scratched GaAs surface during selective etching
Wu, Lei, Yu, Bingjun, Fan, Zhitao, Zhang, Pei, Feng, Chengqiang, Chen, Peng, Ji, Jiaxin, Qian, LinmaoVolume:
105
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2019.104744
Date:
January, 2020
File:
PDF, 2.19 MB
english, 2020