Effects of normal load and etching time on current...

Effects of normal load and etching time on current evolution of scratched GaAs surface during selective etching

Wu, Lei, Yu, Bingjun, Fan, Zhitao, Zhang, Pei, Feng, Chengqiang, Chen, Peng, Ji, Jiaxin, Qian, Linmao
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Volume:
105
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2019.104744
Date:
January, 2020
File:
PDF, 2.19 MB
english, 2020
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